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"Afterall" is a journal of art, context, and inquiry that offers in-depth consideration of the work of contemporary artists from around the world, along with essays that set the work in a broader context. Articles on art history and critical theory applied to art round out each volume. Afterall is written by scholars - but with an eye toward the general reader who is interested in the situation of art and artists in our world. Issue 26 offers new looks at American artist Catherine Sullivan, Brazilian artist and writer Ricardo Basbaum, Spanish conceptualist Valcarcel Madeina, and the influential US collective Group Material. Contextual pieces address forms of radical pedagogy and the intersections between text and aesthetic style; the issue also offers the first-ever English translation of the 1971 Helio Oiticia text "Tropicamp," alongside an essay explaining its importance.
Charles Esche is director of Van Abbemuseum, Eindhoven, the Netherlands, and is also an advisor at the Rijksakademie, Amsterdam. He has curated major exhibitions, including the Ramallah Biennial 2007 and the Istanbul Biennial 2005 with Vasif Kortun, Esra Sarigedik Oktem, and November paynter. Mark Lewis is a photographer, a filmmaker, and a research professor at Central Saint Martins College of Art and Design. In addition to numerous solo exhibitions, his work is part of many permanent collections.
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- ID: 9781846380754
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