This book provides a concise treatment of the chemical phenomena in lithography in a manner that is accessible to a general readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age. The related aspects of lithography are thematically presented to convey a unified view of the developments in the field over time, from the very first recorded reflections on the nature of matter to the latest developments at the frontiers of lithography science and technology. Part I of this book presents several important chemical and physical principles involved in the invention and evolution of lithography. Part II covers the processes for the synthesis, manufacture, usage, and handling of lithographic chemicals and materials. Part III investigates several important chemical and physical principles involved in the practice of lithography. ""Chemistry and Lithography"" is a useful reference for anyone working in the semiconductor industry.
Introduction; Invention of Lithography and Photolithography; Chemical and Optical Origins of Lithography; Evolution of Lithography; Lithographic Chemicals and Materials; Negative Resists; Positive Resists; General Considerations on the Radiation and Photochemistry of Resists; Anti-Reflection Coatings; Stone, Plate and Offset Lithography; The Semiconductor Lithographic Process; Lithographic Modeling; Optical Lithography; Charged Particle Lithography; Implementation of Lithography in Integrated Circuit Device Fabrication; Advanced Lithographic Processing.