The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology.
Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques.
Part One: Physics and chemistry of block copolymer (BCP) materials 1: Physics of block copolymers from bulk to thin films 2: RAFT synthesis of block copolymers and their self-assembly properties 3: Thermal and solvent annealing of block copolymer films 4: Field-theoretic simulations and self-consistent field theory for studying block copolymer directed self-assembly Part Two: Templates and patterning for directed self-assembly 5: Directed self-oriented self-assembly of block copolymers using topographical surfaces 6: Directed self-oriented self-assembly of block copolymers using chemically modified surfaces 7: X-ray characterization of directed self-assembly block copolymers 8: Self-assembly of block copolymers by graphoepitaxy Part Three: Application of directed self-assembly in nanomanufacturing 9: The inverse directed self-assembly problem 10: Directed self-assembly guiding template design for contact hole patterning 11: Modelling and analysis of large-scale, template self-assembly manufacturing techniques