Laser cleaning is very important for modern high technology. It is used, or considered for use in the fabrication of printed circuit boards, in the production of dynamic random access memory (DRAM), in lithography and epitaxial growth, for the removal of contaminations during via-hole production, and for the cleaning of micro-optical and micro-mechanical components.This invaluable book presents the mechanics of the cleaning processes, experimental results, and different applications, including laser cleaning of art. It contains review articles by leading specialists in laser cleaning who participated in the 1st International Workshop on Laser Cleaning, held in Singapore in 2001.
History: the road to "steam laser cleaning", W. Zapka. Dry laser cleaning: dry laser cleaning of particles by nanosecond pulse - theory, N. Arnold and D. Bauerle; optical resonance and near-field effects in dry laser cleaning, B.S. Lukiyanchuk et al. Steam laser cleaning: pulsed laser cleaning of particles from surfaces and optical materials, D.M. Kane et al; liquid-assisted pulsed laser cleaning with near-infrared and ultraviolet pulsed lasers, C.P. Grigoropoulos and D. Kim; new trends in steam laser cleaning, M. Mosbacher et al; physical mechanisms of laser cleaning, V.P. Veiko and E.A. Shakhno. Laser cleaning of artworks: laser ablation applications on complex and delicate surfaces -parameter optimization in cleaning of artworks, V. Zafiropulos; on the theory of discoloration effect in pigments at laser cleaning, B.S. Lukiyanchuk and V. Zafiropulos. Applications of laser cleaning: laser cleaning for field emitter arrays, M. Takai; laser cleaning of organic contamination on microelectronic devices and process real-time monitoring, M.H. Hong et al.
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