Photomask and Next-generation Lithography Mask Technology XIV (Proceedings of SPIE)

Photomask and Next-generation Lithography Mask Technology XIV (Proceedings of SPIE)

Paperback

Up to 2 WeeksUsually despatched within 2 weeks

£109.00 With FREE Saver Delivery

Description

Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Other formats View More

Product Details

  • ISBN13: 9780819467454
  • Format: Paperback
  • ID: 9780819467454
  • ISBN10: 0819467456

Delivery Information

  • Saver Delivery: Yes
  • 1st Class Delivery: Yes
  • Courier Delivery: Yes
  • Store Delivery: Yes

Circuits and Components View More

Electronics and Communications Engineering View More

More like this

Category: Electronics and Communications Engineering» Category: Applied Optics» Category: Books» series: Proceedings of SPIE» publisher: SPIE Press» imprint: SPIE Press»

Prices are for internet purchases only. Prices and availability in WHSmith Stores may vary significantly

Close