Photomask and Next-generation Lithography Mask Technology XIV (Proceedings of SPIE)

Photomask and Next-generation Lithography Mask Technology XIV (Proceedings of SPIE)

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Description

Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

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Product Details

  • ISBN13: 9780819467454
  • Format: Paperback
  • ID: 9780819467454
  • ISBN10: 0819467456

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Category: Technology and Engineering» Category: Electronics Engineering» Category: Applied Optics» series: Proceedings of SPIE» publisher: SPIE Press» imprint: SPIE Press»

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